Ụlọ ọrụ Microelectronics na ụlọ ọrụ mgbawa bụ ihe ndabere nke ụlọ ọrụ na-emepụta ngwá electronic, bụ mpaghara ọkaibe nke asọmpi mmepụta ihe.Na microelectronics na mgbawa ụlọ ọrụ, photoresist bụ otu n'ime isi ihe, na photoresist bụ organic compound.Karịsịa n'ime afọ ndị na-adịbeghị anya, mmepe nke nnukwu sekit jikọtara ọnụ na nke ukwuu emeela ka nyocha, mmepe na ngwa nke photoresists.
Ka ọ dị ugbu a, a na-eji photoresists eme ihe na sekit agbakwunyere (IC), nkwakọ ngwaahịa CPU, sistemụ microelectromechanical (MEMS), ngwaọrụ fotonic (Optoelectronics / Foto), ihe ngosi kristal mmiri (LED, LCD, OLED), ogwe fotovoltaic anyanwụ (Solar PV) na ubi ndị ọzọ, ahịa na-achọ dị ukwuu.Mmepụta photoresist n'oge a na-ejikarị ihe ndị nwere ọla-ọcha nwere foto, mana amachibidoro iji ha na-emesi ike nke obodo mba ụwa na nchekwa gburugburu ebe obibi.Ya mere, mmepe na iji ihe bio-photoreactive photosensitizer aghọwo ihe bụ isi nke mmepe teknụzụ photoresist.N'ime afọ iri gara aga, a na-emepụta ngwa ngwa na ngwa ngwa na United States na Japan, ihe ọhụrụ fotoensitive enyi na enyi na gburugburu ebe obibi dabere na njirimara ndị China nke pentaerythritol tannic acid ka emepụtara ngwa ngwa na United States na Japan, na ọtụtụ gallic acid na pyrogenic gallic acid ebubatala site na. China ma hazie ya ka ọ bụrụ PAC na-ahụ anya.
Nnyocha na mmepe iji kwadebe ọkwa elektrọnik dị elu nke polyhydroxybenzophenone sitere na pyrogenic gallic acid bụ ihe dị mkpa ụlọ ọrụ mmepụta ihe maka photoresist, ọgwụ, UV absorber, resin stabilizer, dye na ubi ndị ọzọ na ụlọ ọrụ microelectronics.N'ime ụlọ ọrụ microelectronics nke na-eto ngwa ngwa taa, a na-ejikarị 3HBP na 4HBP dị ka ndị na-emepụta fotoinitiators na-ahụ maka hydrogen maka ndị na-ese foto dị mma nke UV, nke dị mkpa maka nrụpụta microelectronics dị ka ọkụ iji wetara ihe a kpọrọ mmadụ ìhè.
Oge nzipu: Nov-18-2022
